Semiconductor wafer cleaning is required to remove particle and chemical contamination settled on the surface of the semiconductor. The cleaning process should be done in a manner to avoid any significant damage to the substrate later of the semiconductor.

Microelectronic cleaning plays a crucial role in the effective working of any electronic device. This, in turn, is expected to fuel semiconductor wafer cleaning equipment market during the forecast period.

To ensure cleaning without any damage, dry-physical, plasma, wet-physical, superficial fluid methods, and vapor phase are used. These processes avoid corrosion and roughness on the surface. There are wide array of equipment to execute the cleaning processes for integrated circuits.

Microelectronics cleaning equipment are used to clean printed circuit boards, silicon wafers, write/read heads of HD drives, flat panel displays, heads of HD drives, MEMS, photo masks and compound semiconductor device components. Integrated circuits fabrication industry is primary users. In the vertical, majority of the manufacturing processes require wafer cleaning.

While cleaning microelectronic, several technologies are implemented to remove the effect of contamination and defects on the components. The cleaning process involves the application of cryogenic aerosol, dry, aqueous, and wet chemical cleaning, and supercritical fluid. These techniques are also used in equipment that are used to process single wafer cleaning and batch wafer.

Growth in semiconductor industry, rising demand for smartphones and tablets, and inclination towards single-wafer processing are some of the major factors driving growth of the semiconductor wafer cleaning equipment market.

Global Semiconductor Wafer Cleaning Equipment Market: Snapshot

The global semiconductor wafer cleaning equipment market is primarily being driven by a growing concern for upgrading and enhancing products and production standards in the semiconductor devices industry. Increasing device performance and reliability are core quality standards that the semiconductor industry goes by, and the global semiconductor wafer cleaning equipment market is an essential part of that process. The shift in technology types from conventional to single wafer processing is considered as one of the leading drivers of the global semiconductor wafer cleaning equipment market currently. Additionally, the growing demand for printed electronics and smart gadgets is another driving factor for the global semiconductor wafer cleaning equipment market. The increasing production of semiconductors in developing regions – especially the MEA region – is expected to provide key opportunities for participants over the coming years. However, the market is being stifled by the high capital required to get established in it.

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The global semiconductor wafer cleaning equipment market was valued US$ 4.75 bn in 2018. Owing to growth factors such as the ones mentioned above, this market’s revenue is anticipated to reach USD 7.28 bn by the end of 2027, after expanding at a CAGR of 7.7% from 2019 to 2027.

Rotary Wafer Etching Systems Gather Top Share in Global Semiconductor Wafer Cleaning Equipment Market

The market is segmented into rotary wafer etching system and manual wet batch system, on the basis of equipment types. Rotary wafer etching systems accounted for the dominant share in terms of revenue in 2018, a factor attributed to the increasing application of wafer cleaning and processing equipment in manufacture of a growing array of smart gadgets such as smartphones and in-vehicle entertainment and guidance systems. The market is segmented on the basis of end users, into chemical contamination, metallic contamination, and particle contamination. Metallic and particle contamination processes were the dominant end users in the global semiconductor wafer cleaning equipment market for 2018.

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The market can also be segmented by technology, among which etch cleaning technology was leading it in terms of revenue for 2018, followed by front side up cleaning technology. Rising advancement and technological development in the design and manufacture of semiconductor devices and a growing concern for adherence to production process standards is creating a higher demand for the global semiconductor wafer cleaning equipment market.

APAC Leads Demand for Semiconductor Wafer Cleaning Equipment

Asia Pacific held the dominant share in the global semiconductor wafer cleaning equipment market for 2018, in terms of revenue. It is expected to maintain the leading position over coming years, followed by North America. Its lead is attributed to the growing production unit of semiconductor equipment. In addition, the growing need for portable consumer electronics devices and constantly evolving production quality standards are contributing to the development of the global semiconductor wafer cleaning equipment market. China dominated the market in terms of demand in 2018, within APAC, followed by Taiwan and Japan.

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  • Modutek Corporation (The U.S.)
  • SCREEN Holdings Co., Ltd. (Japan)
  • Speedline Technologies, Inc. (The U.S.)
  • Lam Research Corporation (The U.S.)
  • Falcon Process Systems (The U.S.)
  • ONBoard Solutions Pty Ltd. (Australia)
  • Cleaning Technologies Group (The U.S.)
  • AP&S International GmbH (Germany)
  •  Tokyo Electron Limited (Japan)

were the leaders in the global semiconductor wafer cleaning equipment market for 2018.

Global Semiconductor Wafer Cleaning Equipment Market: Overview

Increasing demand for printed electronics is one of the prime factors which areanticipated to boost the market of semiconductor wafer cleaning equipment in the short, medium, and long term. Increasing demand for single wafer processing is expected to fuel the market in the emerging economies from 2019 to 2027. In addition, manufacturers of semiconductor devices are focusing on expanding their production units in different countries which in turn is considered to be a major driving factor for the Semiconductor Wafer Cleaning Equipment globally.

Single wafer processing is apt for minifab operations. The application of single wafer spin processing technology using hydrogen fluoride and ozonated water primarily accommodates a developer's shift to minifab operations, where shorter cycle times are possible. Increasing demand for single wafer processing is expected to fuel the market. Increasing application of semiconductor wafer cleaning equipment in production of various kinds of smart gadgets and smartphones, in-vehicle systems and a wide range of other electronic devices is one of the prime drivers for the market. Metallic contamination adversely affects semiconductor device performance, which in turn is fueling the application of wafer cleaning equipment across different industries globally. Growing concern for upgrading or improving product efficiency and production standard of semiconductor devices is boosting the demand for semiconductor wafer cleaning equipment. Growing demand for ICs, printed circuit boards (PCBs) other semiconductor equipment along with spurring demand for tablets and other semiconductor devices in developing economies, manufacturers of semiconductor devices are focusing on expanding production units in different countries which in a way is considered to be a major driving factor for the wafer cleaning equipment globally.

Global Semiconductor Wafer Cleaning Equipment: Scope of the Study

Based on product type, the market is segmented into single wafer processing systems, scrubbers and auto wet stations. In addition, by technology, the market is categorized into wet chemistry-based cleaning technology; etch cleaning technology and front side up wafer cleaning technology among others. Moreover, based on equipment type, the market is segmented into rotary wafer etching system and manual wet batch system. Furthermore, based on end use, the market is segmented into metallic contamination, chemical contamination, and particle contamination. Geographically, the global Semiconductor Wafer Cleaning Equipment market is categorized into Asia Pacific, North America, Europe, Latin America, Middle East and Africa. The market report offers the forecast of the market in terms of revenue (USD million) along with a broad study of the market.

Global Semiconductor Wafer Cleaning Equipment Market: Competitive Landscape

The key players in this market have been competitively profiled across the five broad geographic regions. This competitive landscape is inclusive of the various business strategies adopted by these major players and their recent developments in the field of semiconductor wafer cleaning equipment. Moreover, the report includes the patent analysis of semiconductor wafer cleaning equipment. Further, the report includes the market attractiveness analysis of different product, technology equipment types and end use of semiconductor wafer cleaning equipment and insight into the major end use area of the wafer processing equipment. A comprehensive analysis of the market dynamics of the global market that is inclusive of the driving factors, restraint and opportunities is covered under the scope of the research.

The companies involved in this market are focusing on extensive research and development along with acquisitions and mergers to strengthen its foothold in this market. Furthermore, strategic partnership agreement with other companies is also one of the prime business strategies adopted by the semiconductor wafer cleaning equipment companies across different regions globally. SCREEN Holdings Co., Ltd. (Japan), Modutek Corporation (The U.S.), Cleaning Technologies Group (The U.S.), Akrion Systems LLC (The U.S.), Lam Research Corporation (The U.S.), Speedline Technologies, Inc. (The U.S.), ONBoard Solutions Pty Ltd. (Australia), Falcon Process Systems (The U.S.), AP&S International GmbH (Germany), MEI Wet Processing Systems and Services LLC (The U.S.), Tokyo Electron Limited (Japan) among others are operating in the this market globally.

The global Semiconductor Wafer Cleaning Equipment market has been segmented as follows:

Global Semiconductor Wafer Cleaning Equipment Market by Product Type

  • Auto Wet Stations
  • Scrubbers
  • Single Wafer Processing Systems

Global Semiconductor Wafer Cleaning Equipment Market by Technology

  • Wet Chemistry Based Cleaning Technology
  •  Etch Cleaning Technology
  •  Front Side Up Cleaning Technology
  •  Others

Global Semiconductor Wafer Cleaning Equipment Market by Equipment Type

  • Rotary Wafer Etching System
  • Manual Wet Batch System

Global Semiconductor Wafer Cleaning Equipment Market by End Use

  • Metallic Contamination
  •  Chemical Contamination
  •  Particle Contamination

Global Semiconductor Wafer Cleaning Equipment Market by Region  

  • North America
    • The U.S.
    • Mexico
    • Rest of North America 
  • Europe
    • U.K
    • Germany
    • France
    • Italy
    • Rest of Europe
  • Asia Pacific
    • India
    • China
    • Japan
    • South Korea
    • Rest of Asia Pacific
  • Middle East and Africa
    • UAE
    • Saudi Arabia
    • South Africa
    • Rest of Middle East and Africa
  • Latin America
    • Brazil
    • Argentina
    • Rest of Latin America

Thesemiconductor wafer cleaning equipment markethas been segmented as follows:

by Product Type

  • Auto Wet Stations
  • Scrubbers
  • Single Wafer Processing Systems

by Technology

  • Wet Chemistry Based Cleaning Technology
  •  Etch Cleaning Technology
  •  Front Side Up Cleaning Technology
  •  Others

by Equipment Type

  • Rotary Wafer Etching System
  • Manual Wet Batch System

by End Use

  • Metallic Contamination
  •  Chemical Contamination
  •  Particle Contamination

by Region

  • North America
    • The U.S.
    • Canada
    • Mexico
  • Europe
    • U.K
    • Germany
    • Eastern Europe including Russia
    • Italy
    • Rest of Europe
  •  Asia Pacific
    • China
    • Japan
    • South Korea
    • India
    • Taiwan
    • Rest of APAC
  • Middle East and Africa
    • UAE
    • Saudi Arabia
    • Rest of Middle East and Africa
  • Latin America
    • Brazil
    • Argentina
    • Rest of Latin America

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