Global Photoresists and Photoresist Ancillaries Market: Snapshot

Photoresists are indispensable components used in wiring configuration in high density packaging and semiconductor manufacturing. In the coming years, the demand for photoresists and photoresist ancillaries is expected to rise in response to the expanding market for dynamic displays. Also growth in the semiconductor industry will bolster sales opportunities in the global photoresists and photoresist ancillary market. On the flip side, occupational and environmental hazards often related to them may hamper their uptake in the coming years. Nonetheless, the advent of nanoelectromechanical systems will pave way for the market’s expansion in the coming years.

Arf Immersion and Antireflective Coatings Led Photoresists and Photoresist Ancillaries Market, Respectively

The global photoresists and photoresist ancillaries market can be studied on the basis of various parameters. In terms of product, the photoresists market can be segmented into ArF dry, KrF, g-line and i-line, and ArF immersion. Based on revenue, the ArF immersion photoresists accounted for the largest share in the global market in 2013.  Furthermore, the segment is expected to report the fastest CAGR between 2014 and 2020. ArF immersion photoresists offer greater flexibility of manufacturing semiconductors besides other components with supreme resolution and at nano-scale. These factors will enable growth in the segment. Based on product, the global photoresist ancillaries market can be segmented into photoresist developers, antireflective coatings, edge bead removers, and others. Of these, in 2013 the antireflective coatings segment held the nearly 30% of the overall photoresist ancillaries market.

Asia Pacific Emerges Dominant while Europe Reports Sluggish Growth

In 2013 Asia Pacific held dominance in the global market for photoresists and photoresist ancillaries. The increasing demand from the semiconductor and ICs industry is expected to boost the market in Asia Pacific. Furthermore, the rising applications in printed circuit board will give significant impetus to the photoresists and photoresists ancillaries market in Asia Pacific. As per the report, the demand for photoresists and photoresist ancillaries is expected to increase as more companies shift focus towards establishing their footprint in China and South Korea. This trend is likely to support growth of the market in Asia pacific.

In addition, the rising demand from North America is likely to offer lucrative growth prospects to the global market in the coming years. However, in Europe the market is likely to grow at a relatively sluggish pace.

The global photoresists and photoresist ancillary market is currently operating in a highly consolidated vendor landscape. Some of the multinational players are exhibiting a high degree of forward integration, which is aiding in the market’s expansion. They are focusing on customizing products as per the changing consumer needs. This is expected to positively influence the overall market. The report profiles some of the leading players in the global photoresists and photoresist ancillaries market. These include TOKYO OHKA KOGYO CO., LTD., The Dow Chemical Company, JSR Corporation, FUJIFILM Electronics Materials Co. Ltd., Merck KGaA, Shin-Etsu Chemical Co., Ltd., Avantor Performance Materials Inc., E. I. du Pont de Nemours and Company, Sumitomo Chemical Co., Ltd., LG Chem Ltd., and others.

Photoresists are light-sensitive materials that are primarily used in fabrication and packaging of semiconductors, integrated circuits, flat panel displays and printed circuit boards. Photoresists play an important role in photolithography and photo-patterning process. Photoresists consist of resin or polymer, solvent and photo-sensitizer. These are segmented into positive and negative photoresists based on developing option. Photoresists are applied on the surface of a wafer and further exposed to light of pre-determined wavelength. Photoresist ancillaries are supporting materials that are used to improve the efficiency and resolution of the photolithography process. These are used right from the start of the process such as adhesion promotion of photoresists to wafer substrate in order to develop photoresists to remove excessive photoresists after the developer treatment. 
 
Growth in semiconductor industry and dynamic flat panel display technology trends are expected to be the major driving factors for growth of the photoresists and photoresist ancillaries market. However, environmental and occupational health hazards associated with photoresists and photoresist ancillaries component is expected to hamper market growth. The upcoming nanoelectromechanical systems (NEMS) are anticipated to provide opportunities for players in the market. 
 
This report provides detailed analysis and forecast of the photoresists and photoresist ancillaries market on a global and regional level from 2014 to 2020. On the global level, the market has been segmented based on revenue (US$ Mn) from 2014 to 2020. In order to provide in-depth understanding of the market at the regional level, demand has been forecast in terms of revenue (US$ Mn) from 2014 to 2020. The report includes drivers and restraints, and their impact on the growth of the market during the forecast period. The study also encompasses opportunities for market growth at the global level.
 
The report includes a thorough analysis of the value chain in order to provide detailed understanding of the market. It comprises of a Porter’s Five Forces model, which provides an insight into the intensity of competition in the market. Furthermore, the study includes market attractiveness analysis, where various end-users are benchmarked based on market size, growth rate and general attractiveness. The market has been segmented based on product segments and applications. Product segments of photoresists market include g-line and i-line, KrF, ArF dry and ArF immersion. Global photoresists ancillaries market has been segmented as antireflective coatings, photoresists developer, edge bead remover and others. Each segment has been analyzed and forecast based on revenue (USD million) from 2014 to 2020. Additionally, the segments have been analyzed and forecast based on current trends at the global and regional level during the given time period. Regionally, the market has been segmented into North America, Europe, Asia Pacific and Rest of the World (RoW). Market has been analyzed based on demand and forecast trends are based on current trends for the period of six years.
 
Secondary research sources that were typically referred to include, but were not limited to company websites, annual reports, financial reports, broker reports, investor presentations, and SEC filings. Other sources such as internal and external proprietary databases, relevant patent and regulatory databases, national government documents, statistical databases and market reports, news articles, press releases, and webcasts specific to companies operating in the market have also been referred for the report.
 
We conducted primary interviews with industry participants and commentators in order to validate data and analysis. A typical research interview fulfilled functions such as providing first-hand information on market size, market trends, growth trends, competitive landscape and outlook. This helped in validating and strengthening the secondary research findings. Primary research further developed the analysis team’s expertise and market understanding.
 
Profiles of leading companies have been provided in the report along with detailed analysis of their market share. The study features profiles of companies such as JSR Corporation, The Dow Chemical Company, Tokyo Ohka Kogyo Co., Ltd., Avantor Performance Materials Inc., Merck KGaA, FUJIFILM Electronic Materials Co. Ltd., E. I. du Pont de Nemours and Company, Shin-Etsu Chemical Co., Ltd., Sumitomo Chemical Co., Ltd. and LG Chem Ltd.
 
This report segments the global photoresists and photoresist ancillaries market as follows:
  • Photoresists Market - Product Segment Analysis
    • g-line and i-line
    • KrF
    • ArF dry
    • ArF immersion
  • Photoresist Ancillaries Market - Product Segment Analysis
    • Antireflective coatings
    • Photoresist developers
    • Edge bead removers
    • Others (Including primers or adhesion promoters and specialty solvents)
  • Photoresists and Photoresist Ancillaries Market - Application Analysis
    • Semiconductors and integrated circuits (ICs)
    • Printed circuit boards (PCB)
    • Others (Including MEMS, NEMS, sensors etc.)
  • Photoresists and Photoresist Ancillaries Market - Regional Analysis
    • North America
    • Europe
    • Asia Pacific
    • Rest of the World (RoW)
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