Photoresists are photosensitive materials that are used in photolithography and photo-patterning processes. These are used to transfer pattern from photomask onto the surface to form patterned coating when exposed to light. Based on developing type, photoresists are classified into two forms: positive tone and negative tone. Under positive tone photoresists, the portion of the photoresists that is exposed to light becomes soluble by developer treatment. On the other hand, in negative tone photoresists, the portion of photoresists that is exposed to light becomes insoluble upon developer treatment and unexposed portion of the photoresists is dissolved in the photoresist developer. Photoresist ancillaries are the associated products that are used in photolithography and photoengraving along with photoresists. These are used to enhance the efficiency of the process and resolution of transferred pattern.
Growth in the global semiconductor industry is anticipated to drive the photoresists and photoresist ancillaries market worldwide. Photoresists are indispensable components in the process of multi-layer wiring configuration in semiconductor manufacturing and high density packaging. Trends in dynamic display technologies are further estimated to boost the photoresists and photoresist ancillaries market in the near future. However, environmental and occupational health hazards associated with photoresists and photoresist ancillaries are expected to hamper the global market growth in the near future. Upcoming nanoelectromechanical systems (NEMS) are projected to offer high opportunities for market players in the next few years.
Product segments of photoresists include g-line and i-line, KrF, ArF dry and ArF immersion. In terms of revenue, ArF immersion photoresists was the largest segment in the global photoresists market in 2013. It is further estimated to grow at the fastest rate during the forecast period. ArF immersion photoresists provide the flexibility to manufacture semiconductors and other components at nano-scale with supreme resolution. The global photoresist ancillaries market is segmented into antireflective coatings, photoresist developers, edge bead removers and other ancillaries. Antireflective coatings held the largest share of over 30% in the global photoresist ancillaries market in 2013. It is likely to be the fastest growing segment in the next few years.
In terms of revenue, semiconductor & integrated circuits (ICs) emerged as the largest application segment of the global photoresists and photoresist ancillaries market in 2013. The segment accounted for over 55% share in 2013. Semiconductor & ICs segment is anticipated to remain the largest application in the near future. Major end-use industries for semiconductor & ICs application segment include data processing (laptops, servers and personal computers), communication (smartphones, mobile phones, broadband internet and fixed-line telephones), automotive, consumer electronics (music players, household appliances and gaming consoles) and industrial electronics. Printed circuit boards was the second-largest segment for photoresists and photoresist ancillaries in 2013. Demand for photoresists and photoresist ancillaries from other applications that include MEMS, NEMS and sensors is projected to rise at a moderate pace in the next few years.
Asia Pacific dominated the global photoresists and photoresist ancillaries market in terms of revenue in 2013. The region has been experiencing high demand for photoresists and photoresist ancillaries in semiconductor & ICs and printed circuit board applications. Asia Pacific is considered a manufacturing hub for the global electronics industry with China and South Korea being the centers. Demand for raw materials such as photoresists and photoresist ancillaries has increased significantly, as companies are shifting their manufacturing bases to South Korea and China. Demand for photoresists and photoresist ancillaries in North America is anticipated to grow moderately, due to the expected recovery of the semiconductor industry from slump in the region.
Demand for photoresists and photoresist ancillaries in Europe is projected to grow at a sluggish rate in the next few years.
The global photoresists market is highly consolidated. Some multinational companies exhibit a high degree of forward integration and develop customized photoresists and photoresists ancillary products. Key players in the photoresists and photoresist ancillaries market include JSR Corporation, The Dow Chemical Company, TOKYO OHKA KOGYO CO., LTD., Avantor Performance Materials Inc., Merck KGaA, FUJIFILM Electronics Materials Co. Ltd., E. I. du Pont de Nemours and Company, Shin-Etsu Chemical Co., Ltd., Sumitomo Chemical Co., Ltd. and LG Chem Ltd.
Photoresists are light-sensitive materials that are primarily used in fabrication and packaging of semiconductors, integrated circuits, flat panel displays and printed circuit boards. Photoresists play an important role in photolithography and photo-patterning process. Photoresists consist of resin or polymer, solvent and photo-sensitizer. These are segmented into positive and negative photoresists based on developing option. Photoresists are applied on the surface of a wafer and further exposed to light of pre-determined wavelength. Photoresist ancillaries are supporting materials that are used to improve the efficiency and resolution of the photolithography process. These are used right from the start of the process such as adhesion promotion of photoresists to wafer substrate in order to develop photoresists to remove excessive photoresists after the developer treatment.
Growth in semiconductor industry and dynamic flat panel display technology trends are expected to be the major driving factors for growth of the photoresists and photoresist ancillaries market. However, environmental and occupational health hazards associated with photoresists and photoresist ancillaries component is expected to hamper market growth. The upcoming nanoelectromechanical systems (NEMS) are anticipated to provide opportunities for players in the market.
This report provides detailed analysis and forecast of the photoresists and photoresist ancillaries market on a global and regional level from 2014 to 2020. On the global level, the market has been segmented based on revenue (US$ Mn) from 2014 to 2020. In order to provide in-depth understanding of the market at the regional level, demand has been forecast in terms of revenue (US$ Mn) from 2014 to 2020. The report includes drivers and restraints, and their impact on the growth of the market during the forecast period. The study also encompasses opportunities for market growth at the global level.
The report includes a thorough analysis of the value chain in order to provide detailed understanding of the market. It comprises of a Porter’s Five Forces model, which provides an insight into the intensity of competition in the market. Furthermore, the study includes market attractiveness analysis, where various end-users are benchmarked based on market size, growth rate and general attractiveness. The market has been segmented based on product segments and applications. Product segments of photoresists market include g-line and i-line, KrF, ArF dry and ArF immersion. Global photoresists ancillaries market has been segmented as antireflective coatings, photoresists developer, edge bead remover and others. Each segment has been analyzed and forecast based on revenue (USD million) from 2014 to 2020. Additionally, the segments have been analyzed and forecast based on current trends at the global and regional level during the given time period. Regionally, the market has been segmented into North America, Europe, Asia Pacific and Rest of the World (RoW). Market has been analyzed based on demand and forecast trends are based on current trends for the period of six years.
Secondary research sources that were typically referred to include, but were not limited to company websites, annual reports, financial reports, broker reports, investor presentations, and SEC filings. Other sources such as internal and external proprietary databases, relevant patent and regulatory databases, national government documents, statistical databases and market reports, news articles, press releases, and webcasts specific to companies operating in the market have also been referred for the report.
We conducted primary interviews with industry participants and commentators in order to validate data and analysis. A typical research interview fulfilled functions such as providing first-hand information on market size, market trends, growth trends, competitive landscape and outlook. This helped in validating and strengthening the secondary research findings. Primary research further developed the analysis team’s expertise and market understanding.
Profiles of leading companies have been provided in the report along with detailed analysis of their market share. The study features profiles of companies such as JSR Corporation, The Dow Chemical Company, Tokyo Ohka Kogyo Co., Ltd., Avantor Performance Materials Inc., Merck KGaA, FUJIFILM Electronic Materials Co. Ltd., E. I. du Pont de Nemours and Company, Shin-Etsu Chemical Co., Ltd., Sumitomo Chemical Co., Ltd. and LG Chem Ltd.
This report segments the global photoresists and photoresist ancillaries market as follows:
Photoresists Market - Product Segment Analysis
- g-line and i-line
- ArF dry
- ArF immersion
Photoresist Ancillaries Market - Product Segment Analysis
- Antireflective coatings
- Photoresist developers
- Edge bead removers
- Others (Including primers or adhesion promoters and specialty solvents)
Photoresists and Photoresist Ancillaries Market - Application Analysis
- Semiconductors and integrated circuits (ICs)
- Printed circuit boards (PCB)
- Others (Including MEMS, NEMS, sensors etc.)
Photoresists and Photoresist Ancillaries Market - Regional Analysis
- North America
- Asia Pacific
- Rest of the World (RoW)